Outline
The present invention relates to a novel kind of microstructuring method. In particular, the present invention relates to a method to modify and optionally also to engineer structural spectra, i.e. mainly absorption and/or emission spectra of solid materials, especially of metals, in a controlled manner. Specifically, the subject matter of the present invention is a novel lithographic method, by means of which complex microstructures of predefined spectra can be fabricated in at least one, more preferably in at least two spatial directions within a region of relatively large physical dimension.